Characteristics of pulsed DC reactive magnetron sputtered nanocomposite Cr-Zr-N and Cr-Zr-Si-N thin films

碩士 === 國立臺灣科技大學 === 機械工程系 === 98 === The chromium nitride thin film have a good mechanical properties and oxidation resistance. but the drawback is the slightly lower hardness then other hard coatings. the concept of nanocomposite thin films is employed by adding silicon and zirconium to enhanced mi...

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Main Authors: Shih-Tien Chang, 張詩典
Other Authors: Chaur-Jeng Wang
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/14683679469864220269
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spelling ndltd-TW-098NTUS54890792016-04-22T04:23:46Z http://ndltd.ncl.edu.tw/handle/14683679469864220269 Characteristics of pulsed DC reactive magnetron sputtered nanocomposite Cr-Zr-N and Cr-Zr-Si-N thin films 以脈衝直流磁控濺鍍法鍍製氮化鉻鋯與氮化鉻鋯矽奈米複合薄膜性質評估研究 Shih-Tien Chang 張詩典 碩士 國立臺灣科技大學 機械工程系 98 The chromium nitride thin film have a good mechanical properties and oxidation resistance. but the drawback is the slightly lower hardness then other hard coatings. the concept of nanocomposite thin films is employed by adding silicon and zirconium to enhanced microstructures, mechanical properties and corrosion resistance, In this study, The Cr-Zr-N and Cr-Zr-Si-N thin films with various Zr contents ranging from 0.49 at.% to 13.58 at.% were deposited by a bipolar asymmetric pulsed DC reactive magnetron sputtering system. The columnar structure and grain size refinements and the mechanical properties enhancements were observed due to the addition of 6.98 at.% Si to the Cr-Zr-N coating. A texture evolution was observed when the Zr contents of Cr-Zr-Si-N film increased. The hardness increased with increasing Zr contents in the Cr-Zr-Si-N coatings. The Cr-Zr-Si-N coatings with 10.42 at.% Zr content exhibited a combination of high hardness, based on the scratch adhesion strength test results, the adhesion properties of Cr-Zr-Si-N coatings deposited on tool steels are decreased with increasing Zr. The corrosion resistance was analyed by using the potentiostat in 3.5 wt.% NaCl aqueous solution. and the corrosion resistance of the thin films was improved as the Zr content increased. According to the oxidation tests at 850oC,after the annealing test, It is found that volume of thin film increased with increasing Zr contents, In general, the high temperature oxidation resistance of Cr-Zr-Si-N coatings decreased with increasing Zr. Chaur-Jeng Wang 王朝正 2010 學位論文 ; thesis 134 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立臺灣科技大學 === 機械工程系 === 98 === The chromium nitride thin film have a good mechanical properties and oxidation resistance. but the drawback is the slightly lower hardness then other hard coatings. the concept of nanocomposite thin films is employed by adding silicon and zirconium to enhanced microstructures, mechanical properties and corrosion resistance, In this study, The Cr-Zr-N and Cr-Zr-Si-N thin films with various Zr contents ranging from 0.49 at.% to 13.58 at.% were deposited by a bipolar asymmetric pulsed DC reactive magnetron sputtering system. The columnar structure and grain size refinements and the mechanical properties enhancements were observed due to the addition of 6.98 at.% Si to the Cr-Zr-N coating. A texture evolution was observed when the Zr contents of Cr-Zr-Si-N film increased. The hardness increased with increasing Zr contents in the Cr-Zr-Si-N coatings. The Cr-Zr-Si-N coatings with 10.42 at.% Zr content exhibited a combination of high hardness, based on the scratch adhesion strength test results, the adhesion properties of Cr-Zr-Si-N coatings deposited on tool steels are decreased with increasing Zr. The corrosion resistance was analyed by using the potentiostat in 3.5 wt.% NaCl aqueous solution. and the corrosion resistance of the thin films was improved as the Zr content increased. According to the oxidation tests at 850oC,after the annealing test, It is found that volume of thin film increased with increasing Zr contents, In general, the high temperature oxidation resistance of Cr-Zr-Si-N coatings decreased with increasing Zr.
author2 Chaur-Jeng Wang
author_facet Chaur-Jeng Wang
Shih-Tien Chang
張詩典
author Shih-Tien Chang
張詩典
spellingShingle Shih-Tien Chang
張詩典
Characteristics of pulsed DC reactive magnetron sputtered nanocomposite Cr-Zr-N and Cr-Zr-Si-N thin films
author_sort Shih-Tien Chang
title Characteristics of pulsed DC reactive magnetron sputtered nanocomposite Cr-Zr-N and Cr-Zr-Si-N thin films
title_short Characteristics of pulsed DC reactive magnetron sputtered nanocomposite Cr-Zr-N and Cr-Zr-Si-N thin films
title_full Characteristics of pulsed DC reactive magnetron sputtered nanocomposite Cr-Zr-N and Cr-Zr-Si-N thin films
title_fullStr Characteristics of pulsed DC reactive magnetron sputtered nanocomposite Cr-Zr-N and Cr-Zr-Si-N thin films
title_full_unstemmed Characteristics of pulsed DC reactive magnetron sputtered nanocomposite Cr-Zr-N and Cr-Zr-Si-N thin films
title_sort characteristics of pulsed dc reactive magnetron sputtered nanocomposite cr-zr-n and cr-zr-si-n thin films
publishDate 2010
url http://ndltd.ncl.edu.tw/handle/14683679469864220269
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