low temperature alumunum diffusion into a-Si:H layer and study of a-SiNx:H passivation layer
碩士 === 國立臺灣科技大學 === 化學工程系 === 98 === First part of this thesis fabricates p+ thin film by aluminum low temperature diffusion in amorphous silicon thin film. p+ thin film fabricated under different experimental parameters, such as diffusion temperature and dif...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/68109295768380016129 |