| Summary: | 碩士 === 國立臺灣海洋大學 === 電機工程學系 === 98 === The purpose of this study is to examine the features of Neodymium-doped yttrium aluminum garnet (Nd:YAG) and to investigate the feasibility of applying Nd:YAG laser on silicon wafers. Nd:YAG is a solid laser which emits 1064 nm wavelength. It has several advantages such as high intensity, high orientation, and mono-chromatity. It can be used to reach an ultra-high temperature at a very shot time and the next moment it can return to a normal temperature. Nd:YAG laser not only has high resonance efficiency and large output of laser beam source, but it is also stable. Due to such advantages, it has been widely applied in many industries. In this study, we stimulated the single wave light through an excitation source to release the laser. After one increases the energy of Nd:YAG laser beam, it can be used in various industries
Applying Nd:YAG laser on the silicon wafer has some advantages, such as fast fabrication and low costs. The present study is to examine the single (sc) and multi crystalline (mc) silicon solar cell efficiency by controlling the energy, speed, and frequency of Nd:YAG laser.
This study focuses on investigating how changing the laser power (i.e, depth of laser), laser line width, and the marking area of solar cell affects the reflection of Si wafer and electro-optic transfer efficiency. The main purpose is to study how the characteristics of laser affect the burn spots of solar cells and how these characteristics affect the size of those burn spots and the grooves of a solar cell. By so doing, we hope to increase the reflection and mobility of photon in the grooves in order to lower the reflectance and increase conversion efficiency of a solar cell.
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