A study of Hydrophilic CMP Graphite Impregnated Pad and it’s Characteristics of Conditioning and Polishing Wafer for Oxide Film
碩士 === 國立勤益科技大學 === 機械工程系 === 98
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| Language: | zh-TW |
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2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/h2stgn |
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ndltd-TW-098NTIC5489211 |
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oai_dc |
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ndltd-TW-098NTIC54892112019-05-15T21:43:12Z http://ndltd.ncl.edu.tw/handle/h2stgn A study of Hydrophilic CMP Graphite Impregnated Pad and it’s Characteristics of Conditioning and Polishing Wafer for Oxide Film 親水性石墨拋光墊修整特性及其氧化層晶圓性能之研究 Li-Wei Yan 顏力偉 碩士 國立勤益科技大學 機械工程系 98 蔡明義 2010 學位論文 ; thesis 86 zh-TW |
| collection |
NDLTD |
| language |
zh-TW |
| format |
Others
|
| sources |
NDLTD |
| description |
碩士 === 國立勤益科技大學 === 機械工程系 === 98 |
| author2 |
蔡明義 |
| author_facet |
蔡明義 Li-Wei Yan 顏力偉 |
| author |
Li-Wei Yan 顏力偉 |
| spellingShingle |
Li-Wei Yan 顏力偉 A study of Hydrophilic CMP Graphite Impregnated Pad and it’s Characteristics of Conditioning and Polishing Wafer for Oxide Film |
| author_sort |
Li-Wei Yan |
| title |
A study of Hydrophilic CMP Graphite Impregnated Pad and it’s Characteristics of Conditioning and Polishing Wafer for Oxide Film |
| title_short |
A study of Hydrophilic CMP Graphite Impregnated Pad and it’s Characteristics of Conditioning and Polishing Wafer for Oxide Film |
| title_full |
A study of Hydrophilic CMP Graphite Impregnated Pad and it’s Characteristics of Conditioning and Polishing Wafer for Oxide Film |
| title_fullStr |
A study of Hydrophilic CMP Graphite Impregnated Pad and it’s Characteristics of Conditioning and Polishing Wafer for Oxide Film |
| title_full_unstemmed |
A study of Hydrophilic CMP Graphite Impregnated Pad and it’s Characteristics of Conditioning and Polishing Wafer for Oxide Film |
| title_sort |
study of hydrophilic cmp graphite impregnated pad and it’s characteristics of conditioning and polishing wafer for oxide film |
| publishDate |
2010 |
| url |
http://ndltd.ncl.edu.tw/handle/h2stgn |
| work_keys_str_mv |
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