Enhanced electrical characteristics of pMOSFET with Virtual Ge Substrate by Si cap and using nitridation of plasma implantation

Enhanced electrical characteristics of pMOSFET with Virtual Ge Substrate by Si cap and using nitridation of plasma implantation

碩士 === 國立清華大學 === 工程與系統科學系 === 98

Bibliographic Details
Main Authors:	Lee, Tung-Ting, 李東庭
Other Authors:	Chang-Liao, Kuei-Shu
Format:	Others
Language:	zh-TW
Published:	2010
Online Access:	http://ndltd.ncl.edu.tw/handle/58074035879491295441

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