Deformation Mechanism and Shear Banding Behavior in Amorphous/Nanocrystalline Multilayer System

碩士 === 國立中山大學 === 材料與光電科學學系研究所 === 98 === Over the past decades, bulk metallic glasses (BMGs) have attracted extensive interests because of their unique physical and chemical properties such as good corrosion resistance, larger elastic elongation limit and high strength and hardness. They are al...

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Bibliographic Details
Main Authors: I-Chin Lin, 林逸志
Other Authors: Dr. Jacob Chih-Ching Huang
Format: Others
Language:en_US
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/75464238429249259623
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Summary:碩士 === 國立中山大學 === 材料與光電科學學系研究所 === 98 === Over the past decades, bulk metallic glasses (BMGs) have attracted extensive interests because of their unique physical and chemical properties such as good corrosion resistance, larger elastic elongation limit and high strength and hardness. They are also seen as the potential material for micro-electro-mechanical systems (MEMS). However, despite many extraordinary properties in BMGs, BMGs might be difficult to be made into MEMS, different from thin film metallic glasses (TFMGs). Compared with BMGs, few studies have been carried out on TFMGs and their application for MEMS. In this study, efforts have been made to study the properties of multilayered TFMGs. The multilayer thin film selected in this thesis is amorphous/nanocrystalline nanolaminate systems. The micro-pillars of multilayered TFMGs with diameter of 1 μm are fabricated by using focus ion beam (FIB) and tested in microcompression at room temperature. On nano-indentation test, the phenomenon of strain burst decreases by way of multilayer system. It means that the multilayer system can retard the shear band propagation initiated from the amorphous layers. Under the microcompression test, the deformation of both ZrCu (100 nm)/Cu (50 nm) and ZrCu (100 nm)/Cu (10 nm) multilayer micro-pillars are still dominated by the emission of shear bands in a manner of strain burst to release the energy, but the ZrCu (100 nm)/Cu (100 nm) multilayer thin films reveal continuous deformation and smooth stress-strain curve with no strain burst. First, the sufficient thick of copper layer can absorb more energy from shear deformation of amorphous layer. Second, the copper layer exhibits plastic flow along the transverse direction under the iso-stress deformation. The transverse plastic flow acts as a shear force at interface causing non-stress concentration at amorphous layer. It means that the amorphous layer can be deformed to large plastic strain without stress concentration, causing a homogeneous deformation. According to these two deformation mechanisms, it is possible that the ZrCu (100 nm)/Cu (100 nm) multilayer thin film is better system for improving the ductility of amorphous alloy with a good strength.