探討最後一個量子井井障厚度對紫光與藍光氮化銦鎵發光二極體發光性能之影響

碩士 === 國立彰化師範大學 === 光電科技研究所 === 98 === In this thesis, optical performance of InGaN light-emitting diodes with varied thicknesses in the last barrier is systematically investigated by using the APSYS simulation program. Specifically, the analyses focus on light output power, carrier distribution in...

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Main Author: 張淑貞
Other Authors: 郭艷光
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/06625861300117646167
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spelling ndltd-TW-098NCUE56140162015-11-04T04:01:42Z http://ndltd.ncl.edu.tw/handle/06625861300117646167 探討最後一個量子井井障厚度對紫光與藍光氮化銦鎵發光二極體發光性能之影響 張淑貞 碩士 國立彰化師範大學 光電科技研究所 98 In this thesis, optical performance of InGaN light-emitting diodes with varied thicknesses in the last barrier is systematically investigated by using the APSYS simulation program. Specifically, the analyses focus on light output power, carrier distribution in quantum wells, recombination rate, and electron overflow of the studied structures. The simulation results show that great improvement was reported in the optical properties of the violet InGaN light-emitting diode of which the last barrier is thinner. The improvement is based on the fact that use of a thinner last-barrier is beneficial for increasing the hole injection efficiency and the probability of electron transporting back into the quantum well. When the amount of holes injected into the active region increases, the light-emitting diode would reduce the amount of electrons leaking from the active region to the p-side layers. Accordingly, the radiative recombination and output power of the light-emitting diode are enhanced when the thinner last barrier is utilized. In chapter 1, the literatures and papers related to the concept of hole distribution in active region are introduced and the methods of producing white light-emitting diodes are also described. In chapter 2, structures of the violet and blue light-emitting diodes under study as well as the physical parameters used in the APSYS simulation program are introduced. In chapter 3, the violet InGaN light-emitting diodes with varied thicknesses in the last barrier are investigated. The band diagrams, electron and hole distributions in th active region, and radiative recombination rate are analyzed and compared. In chapter 4, the blue InGaN light-emitting diodes with varied thicknesses in the last barrier are investigated. The band diagrams, electron and hole distributions in th active region, and radiative recombination rate are analyzed and compared. Finally, a summary to the previous studies is provided in chapter 5. 郭艷光 2010 學位論文 ; thesis 78 zh-TW
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description 碩士 === 國立彰化師範大學 === 光電科技研究所 === 98 === In this thesis, optical performance of InGaN light-emitting diodes with varied thicknesses in the last barrier is systematically investigated by using the APSYS simulation program. Specifically, the analyses focus on light output power, carrier distribution in quantum wells, recombination rate, and electron overflow of the studied structures. The simulation results show that great improvement was reported in the optical properties of the violet InGaN light-emitting diode of which the last barrier is thinner. The improvement is based on the fact that use of a thinner last-barrier is beneficial for increasing the hole injection efficiency and the probability of electron transporting back into the quantum well. When the amount of holes injected into the active region increases, the light-emitting diode would reduce the amount of electrons leaking from the active region to the p-side layers. Accordingly, the radiative recombination and output power of the light-emitting diode are enhanced when the thinner last barrier is utilized. In chapter 1, the literatures and papers related to the concept of hole distribution in active region are introduced and the methods of producing white light-emitting diodes are also described. In chapter 2, structures of the violet and blue light-emitting diodes under study as well as the physical parameters used in the APSYS simulation program are introduced. In chapter 3, the violet InGaN light-emitting diodes with varied thicknesses in the last barrier are investigated. The band diagrams, electron and hole distributions in th active region, and radiative recombination rate are analyzed and compared. In chapter 4, the blue InGaN light-emitting diodes with varied thicknesses in the last barrier are investigated. The band diagrams, electron and hole distributions in th active region, and radiative recombination rate are analyzed and compared. Finally, a summary to the previous studies is provided in chapter 5.
author2 郭艷光
author_facet 郭艷光
張淑貞
author 張淑貞
spellingShingle 張淑貞
探討最後一個量子井井障厚度對紫光與藍光氮化銦鎵發光二極體發光性能之影響
author_sort 張淑貞
title 探討最後一個量子井井障厚度對紫光與藍光氮化銦鎵發光二極體發光性能之影響
title_short 探討最後一個量子井井障厚度對紫光與藍光氮化銦鎵發光二極體發光性能之影響
title_full 探討最後一個量子井井障厚度對紫光與藍光氮化銦鎵發光二極體發光性能之影響
title_fullStr 探討最後一個量子井井障厚度對紫光與藍光氮化銦鎵發光二極體發光性能之影響
title_full_unstemmed 探討最後一個量子井井障厚度對紫光與藍光氮化銦鎵發光二極體發光性能之影響
title_sort 探討最後一個量子井井障厚度對紫光與藍光氮化銦鎵發光二極體發光性能之影響
publishDate 2010
url http://ndltd.ncl.edu.tw/handle/06625861300117646167
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