| Summary: | 碩士 === 國立中央大學 === 化學工程與材料工程研究所 === 98 === In the study, we have proposed a novel and cost-effective technique to fabricate ultra-thin anodic aluminum oxide (AAO) templates with ordered nanopore structures on Si substrates. The pore diameters of the ultra-thin AAO templates can be precisely controlled in the range of 70 to 90 nm, and their aspect ratio can be made 4:1 or less. The ultra-thin AAO membrane can serve as the template for the fabrication of various OD nanostructures without complex lithography.
The present study has demonstrated that large-area well-ordered Ni metal nanodot arrays were successfully fabricated on (001) Si substrates using ultra-thin AAO as the shadow masks for the deposition of Ni thin films. The Ni nanodots produced have the shape of semi-sphere and their average diameter was about 7x nm, corresponding to the pore size of the ultra-thin AAO template. Based on the TEM and selected-area electron diffraction (SAED) analysis, it is found that all the Ni nanodots produced were polycrystalline and these Ni nanodots possess a FCC structure.
In addition, the periodic Ni nanodots array can be served as the hard masks for the fabrication of Si nanowires (SiNWs). This study has also demonstrated that high density SiNWs were successfully produced on (001) Si substrates by using the Ni nanodot masks in conjunction with the Au-assisted selective etching process. TEM and SAED analysis indicated that all the SiNWs produced were single crystalline and their axial orientations were along [001] direction.
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