A study of the high-temperature oxidation and nanoindentation behaviors of the SiGe thin film
碩士 === 國立交通大學 === 機械工程學系 === 98 === The purpose of this study was to investigate the effect of high-temperature oxidation on the material and mechanical properties of SiGe/Si heterostructures which can serve as virtual substrates. A homogeneous SiGe epilayer was deposited by ultrahigh vacuum-chemica...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/40195100226268712392 |