The Observation and Removement of Damages layer in GaN substrates after CMP
碩士 === 國立交通大學 === 電子物理系所 === 98 === In this work , the major purpose was to study the surface roughness and sub-surface damage of GaN substrates and expect to obtain epi-ready GaN substrate. We studied the surface roughness by atomic force microscope to acquire the optimum parameter of mechanical po...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/73570297446902719874 |