| Summary: | 碩士 === 國立成功大學 === 機械工程學系碩博士班 === 98 === Compared to traditional photolithography, the nano-imprinting method is superior for the reduction of the processing time and the capabilities of making various structures, also those with polymers. However, due to the effects of processing temperature, composing of materials, interatomic bondings, and deformation, to model the radiative properties of structures with polymers would be challengeable. As a result, to design optical devices and other applications is difficult. Hence, this work investigated the infrared transmittance through several microscale one-dimensional simple/complex gratings both experimentally and theoretically. These samples of different profiles are composed of metals (Au and Cr), a polymer (PMMA), and a medium-doped (8.2×1016cm-3) Si substrate and fabricated through contact-transferred and mask-embedded lithography method. The normal transmittances were measured at two linear polarizations in the mid-infrared region (2.5 um to 25 um) with a Fourier Transform Infrared (FT-IR) spectrometer. The measured transmittance spectra are compared with numerical results from the rigorous coupled-wave analysis (RCWA). Unique spectrum of samples were demonstrated and explained with physical mechanisms. Moreover, this work also investigated the optical constants of PMMA and highly-doped Si in the infrared region.
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