Development of High Resistance of Thin Film Resistor by Sputtering
碩士 === 國立成功大學 === 電機工程學系碩博士班 === 98 === Abstract In this study, to prepare Cr-Si-Al resistive films in high-purity alumina substrate by DC magnetron sputtering method. FE-SEM and GI-XRD were used to observe the microstructure of thin films in order to explore the influence and relationships of the d...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/15768502061282401712 |