Investigation on the structural characteristics of In2O3 films
碩士 === 國立中興大學 === 物理學系所 === 98 === In this study, the structural characteristics of In2O3 films deposited on (0001) sapphire substrates were analysed by transmission electron microscopy (TEM), x-ray diffraction (XRD), and scanning electron microscope (SEM). In2O3 films were grown by atomic layer dep...
Main Authors: | Hsin-Lun Su, 蘇信綸 |
---|---|
Other Authors: | Jyh-Rong Gong |
Format: | Others |
Language: | zh-TW |
Published: |
2010
|
Online Access: | http://ndltd.ncl.edu.tw/handle/94413931364762981425 |
Similar Items
-
Characteristics Investigation of V2O5 Resistance Characteristics Investigation of V2O5 Resistance Random Access Memory Thin Films
by: Feng-Yi Su, et al.
Published: (101) -
Depositing Al2O3 thin film on LiNbO3 substrates by e-beam evaporation to improve properties of the SAW devices
by: Li-lun Hsu, et al.
Published: (2007) -
Effect of ZrO2 Nanoparticles on Soft Regime Behavior of Film Coating Using Plasma Electrolytic Oxidation
by: Hsin-Lun Liu, et al.
Published: (2017) -
Characteristic investigation of SnO2-ZnO dual active layer thin film transistors with different processing conditions
by: Su, Yi-Hsuan, et al.
Published: (2019) -
Study of p-Cu2O Thin Film Solar Cells
by: Yin-Lun Ho, et al.
Published: (2011)