| Summary: | 碩士 === 華梵大學 === 電子工程學系碩士班 === 99 === Abstract
This paper is to present the research about producing titanium oxide membrane using an anodic oxidation technique on pure titanium substrate (99.5%) applied to the UV-sensing. This technique is different with previous sputtering method due to its low cost of processing equipment and simple process to reduce manufacture time.
Compare with the surface morphology of un-annealed and annealed TiO2 and analyze their characteristics using Reflectance UV spectrum, XRD, SEM, and Kaithley4200 in this thesis. The results show that the absorption of un-annealed sample was 76% to 83% higher than that of annealed one with 71%~79% in 200~400 nm. XRD crystal structure analysis shows the appearance of anatase type when the titanium oxide in annealing treatment at 350 oC. As the anneal temperature rise to 550 oC, the rutile also appears. In UV measurement, Kaithley4200 system was used to take the dark and photo currents. The structure of UV sensors was adopted lateral Ti/TiO2/Ti structure and the distance of two electrodes was fixed at 1 mm. For un-annealed sample, its photocurrent density is 3.4 mA/cm2 and dark current density is 2.1 nA/cm2. For annealed sample, its photocurrent density is 7.7 A/cm2 and dark current density is 0.96 nA/cm2.
So, in this thesis a high performance UV sensor was realized without thermal annealing when it biased at 1 V, its corresponding photo response could reach 40.7 mA/W and on/off current ratio was about 106.
Keywords: Titanium oxide membrane, Anodic oxidation technique, Annealing.
|
|---|
