Advanced Layout Technology Considering Reliability and Process Variation

碩士 === 輔仁大學 === 電子工程學系 === 98 === The device size has been developed from deep sub-micron to nanometer generation accompanying with the evolution of semi-conductor process technology in order to improve the performance of the integrated circuit, operation speed and the cost. However, there are probl...

Full description

Bibliographic Details
Main Authors: Chieh-Ming Yang, 楊捷名
Other Authors: Kuan-Jen Lin
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/10318104520226733186