| Summary: | 碩士 === 逢甲大學 === 材料與製造工程所 === 98 === Pulsed magnetron sputtering of a titanium target at various reactive partial-pressure atmospheres (Ar/O2/N2) was used to fabricate thin films of titanium mono-oxide (TiO), titanium dioxide (TiO2), and nitrided countparts (TiO1-xNx and TiO2−xNx) onto glass substrates and post-oxidation was executed to modulate the films’ microstructure, aiming at obtaining films with super-hydrophilicity.
The films properties, particularly microstructure and hydrophilicity, were examined by x-ray diffractometry (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and water droplet method (for contact angle measurement). The result revealed that the TiO1−xNx thin films are transformed into rutile- TiO2−xNx after oxidation annealing at temperatures of 500℃ or greater. XRD shows that the pristine TiO2−xNx thin films are poorly crystallized, and can be crystallized into dual-phase (anatase and rutile) by the same annealing. The strength of the anatase phase increases with the increase in the N2-to-O2 partial pressure ratio. In addition, SEM and AFM reveal that the roughness of the films is in the nm-range and increases with the increase in the N2-to-O2 partial pressure ratio.
When fabricated by optimized sputtering and post-annealing conditions, the TiO2−xNx thin films exhibit super-hydrophilicity with a contact angle of only 4°. The reasons behind this achievement will be discussed.
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