Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique

碩士 === 大葉大學 === 電機工程學系 === 98 === This thesis is to study the effect of micro-structure on anti-reflection for a transparent conducting layer (TCL). The process to form micro-structure on a TCL is as following. First, an Al film was deposited on TCL by E-beam evaporation. Then, porous alumina membr...

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Main Authors: kun Ming Liu, 劉坤明
Other Authors: Ta-hsiang Hu
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/29695645499267717412
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spelling ndltd-TW-098DYU004420642015-10-13T18:16:16Z http://ndltd.ncl.edu.tw/handle/29695645499267717412 Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique 以陽極氧化鋁技術粗化透明導電層並應用於太陽能電池 kun Ming Liu 劉坤明 碩士 大葉大學 電機工程學系 98 This thesis is to study the effect of micro-structure on anti-reflection for a transparent conducting layer (TCL). The process to form micro-structure on a TCL is as following. First, an Al film was deposited on TCL by E-beam evaporation. Then, porous alumina membrane pores were formed by anodic oxidation technology. Next, TCL was wet etched to form micro-structure on surface by using porous alumina membrane as mask. The aperture size can be controlled with different anodic oxidation conditions, such as oxidation time, oxidation voltage, barrier layer removal and pore widening time. Both surface morphology and aperture size were examined by field emission scanning electron microscopy. Finally, TCL with micro-structure was applied to solar cells for anti-reflection. Ta-hsiang Hu Hung-Pin Shiao 胡大湘 蕭宏彬 2010 學位論文 ; thesis 42 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 大葉大學 === 電機工程學系 === 98 === This thesis is to study the effect of micro-structure on anti-reflection for a transparent conducting layer (TCL). The process to form micro-structure on a TCL is as following. First, an Al film was deposited on TCL by E-beam evaporation. Then, porous alumina membrane pores were formed by anodic oxidation technology. Next, TCL was wet etched to form micro-structure on surface by using porous alumina membrane as mask. The aperture size can be controlled with different anodic oxidation conditions, such as oxidation time, oxidation voltage, barrier layer removal and pore widening time. Both surface morphology and aperture size were examined by field emission scanning electron microscopy. Finally, TCL with micro-structure was applied to solar cells for anti-reflection.
author2 Ta-hsiang Hu
author_facet Ta-hsiang Hu
kun Ming Liu
劉坤明
author kun Ming Liu
劉坤明
spellingShingle kun Ming Liu
劉坤明
Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique
author_sort kun Ming Liu
title Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique
title_short Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique
title_full Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique
title_fullStr Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique
title_full_unstemmed Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique
title_sort fabrication of roughen transparent conductive layer on solar cells by anodic aluminum oxide technique
publishDate 2010
url http://ndltd.ncl.edu.tw/handle/29695645499267717412
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