Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique
碩士 === 大葉大學 === 電機工程學系 === 98 === This thesis is to study the effect of micro-structure on anti-reflection for a transparent conducting layer (TCL). The process to form micro-structure on a TCL is as following. First, an Al film was deposited on TCL by E-beam evaporation. Then, porous alumina membr...
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ndltd-TW-098DYU004420642015-10-13T18:16:16Z http://ndltd.ncl.edu.tw/handle/29695645499267717412 Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique 以陽極氧化鋁技術粗化透明導電層並應用於太陽能電池 kun Ming Liu 劉坤明 碩士 大葉大學 電機工程學系 98 This thesis is to study the effect of micro-structure on anti-reflection for a transparent conducting layer (TCL). The process to form micro-structure on a TCL is as following. First, an Al film was deposited on TCL by E-beam evaporation. Then, porous alumina membrane pores were formed by anodic oxidation technology. Next, TCL was wet etched to form micro-structure on surface by using porous alumina membrane as mask. The aperture size can be controlled with different anodic oxidation conditions, such as oxidation time, oxidation voltage, barrier layer removal and pore widening time. Both surface morphology and aperture size were examined by field emission scanning electron microscopy. Finally, TCL with micro-structure was applied to solar cells for anti-reflection. Ta-hsiang Hu Hung-Pin Shiao 胡大湘 蕭宏彬 2010 學位論文 ; thesis 42 zh-TW |
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碩士 === 大葉大學 === 電機工程學系 === 98 === This thesis is to study the effect of micro-structure on anti-reflection for a transparent conducting layer (TCL). The process to form micro-structure on a TCL is as following. First, an Al film was deposited on TCL by E-beam evaporation. Then, porous alumina membrane pores were formed by anodic oxidation technology. Next, TCL was wet etched to form micro-structure on surface by using porous alumina membrane as mask. The aperture size can be controlled with different anodic oxidation conditions, such as oxidation time, oxidation voltage, barrier layer removal and pore widening time. Both surface morphology and aperture size were examined by field emission scanning electron microscopy. Finally, TCL with micro-structure was applied to solar cells for anti-reflection.
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Ta-hsiang Hu |
author_facet |
Ta-hsiang Hu kun Ming Liu 劉坤明 |
author |
kun Ming Liu 劉坤明 |
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kun Ming Liu 劉坤明 Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique |
author_sort |
kun Ming Liu |
title |
Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique |
title_short |
Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique |
title_full |
Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique |
title_fullStr |
Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique |
title_full_unstemmed |
Fabrication of Roughen Transparent Conductive Layer on Solar Cells by Anodic Aluminum Oxide Technique |
title_sort |
fabrication of roughen transparent conductive layer on solar cells by anodic aluminum oxide technique |
publishDate |
2010 |
url |
http://ndltd.ncl.edu.tw/handle/29695645499267717412 |
work_keys_str_mv |
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