Taguchi experiments analysis, qualities measurement and thickness control by fuzzy control law for TiN films

• Main Authors: Yan- Wei Chen, 陳彥維
• Other Authors: 牟善琦
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/66881978554562502984

碩士 === 清雲科技大學 === 機械工程所 === 98 === 　　In this paper, the TiN optimel experiment is using the Taguchi method to get the best parameter for pulsed-DC magnetron sputter system, us the fixed current, fixture rotation, temperature, and the parameters of worki0ng distance and angles that select the level for Pulsed-DC magnetron sputter system. The parameters of working time, power, argon flow and nitrogen flow by using L9(34) orthogonal arrays. Afterwards, using S/N ratio of L9(34) orthogonal arrays of analyze the experiment, sputtering the TiN films optimization for the film hardness, and the average roughness to calculate the best parameter set. In the L9 orthogonal array by adjusting the range, using the L18 Interaction orthogonal array selected the work of time, power, argon gas flow, nitrogen flow parameters in the second stage, by the S / N on the rate, hardness, roughness analysis of optimization. From this experiment, by the three optimizat, needs to take into account the interaction of the combination. The first half is power 400 W,argon gas flow rate 30 sccm (B1, C3) and take the film hardness main effect of the power and argon gas flow, reservation interaction of power 400 W,nitrogen flow 20 sccm (B1, D3). In addition to power 400 W and argon gas flow 30 sccm (B1, C3)of the average roughness, the nitrogen flow 15 sccm (D2) take main effect of film hardness, roughness and interaction of nitrogen flow and argon gas flow. Then finally optimized, the deposition rate to select the main effect of Pulse on, so the second stage, optimal combination is Pulse on 200 μs, power 400 W, nitrogen flow 30 sccm and argon gas flow 15 sccm (A2, B1, C3, D2).