A Study of Laser Scribing for Amorphous Silicon and CIGS Thin Film Solar Cells

• Main Authors: Jen-Wei Cheng, 鄭仁維
• Other Authors: Yeeu-Chang Lee
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/99826104271186933784

碩士 === 中原大學 === 機械工程研究所 === 98 === Nd:YAG laser is widely applied to the laser scribing of thin film solar cells. The pulsed width of Nd:YAG laser is normally nanosecond order, which will induce thermal effect during process. The study mainly focused on the scribing quality of the thin film solar cell by using nanosecond laser and ultra-short pulse (10-15sec) femtosecond laser. Optical microscope (OM), scanning electron microscope (SEM), atomic force microscope (AFM) and α-step were used to investigate the surface morphology after laser scribing. The photo-chemical mechanism of femtosecond laser process is different from the photo-thermal mechanism of nanosecond laser. The experimental results showed no matter the scribing width and depth or the electrical characteristic, the performance of the femtoseconf laser is better than that of nanosecond laser. Bumps appeared at the edge of scribing line from the remelting effect of the nanosecond laser process was not shown in the femtosecond laser process.