Using Design Of Experiment Approach to Improve BM lost Ratio of Color Filter Black Matrix Process

• Main Authors: Chia-Lung Lu, 盧嘉隆
• Other Authors: Wu-Yih Uen
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/40345293249593431496

碩士 === 中原大學 === 電子工程研究所 === 98 === Color filter (CF) is one of the most essential materials in a TFT-LCD Panel. Since the size of color filter and TFT array must be identical for the production of the panel. Therefore, the quality of Color Filter will be affect the overall quality assurance of the LCD panel. Black matrix (BM) process of color filter will reduce the yield because of the presence of defects of BM lost. To reduce the scrap of BM lost that affects the cost of TFT-LCD, we used Design of Experiment (DOE) method to identify significant factors that cause BM lost. Further, we obtained the optimum processing parameters from the experimental results to reduce BM lost. It has been found that using the DOE approach with the optimum parameters would greatly improve both the processing capability of CF manufacturing and the conforming rate of the color image in display.