A Post-Processing Approach to Minimize TSV Number in High-Level Synthesis

碩士 === 中原大學 === 電子工程研究所 === 98 === Three Dimensional (3D) IC technology stacks multiple integrated chips and its application is more and more popular. Therefore, developing EDA tools for the requirement of 3D architecture becomes urgent and important. In this thesis, we present an integer linear...

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Main Authors: Tsorng-Yu Huang, 黃琮淯
Other Authors: Shih-Hsu Huang
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/44769486642214863678
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spelling ndltd-TW-098CYCU54280542015-10-13T18:44:54Z http://ndltd.ncl.edu.tw/handle/44769486642214863678 A Post-Processing Approach to Minimize TSV Number in High-Level Synthesis 高階合成階段之最小化矽穿孔數量的後處理方法 Tsorng-Yu Huang 黃琮淯 碩士 中原大學 電子工程研究所 98 Three Dimensional (3D) IC technology stacks multiple integrated chips and its application is more and more popular. Therefore, developing EDA tools for the requirement of 3D architecture becomes urgent and important. In this thesis, we present an integer linear programming (ILP) model for the application of resource layer assignment in high level synthesis. Our objective is to minimize the number of signal through-silicon-vias (TSVs) under both the layer number constraint and the footprint area constraint. Our work includes two possible applications: (1) a post-processing method to perform TSV number minimization for high-level synthesis of 3D ICs; (2) a post-processing method to transfer a design from 2D IC structure into 3D IC structure. Note that our approach guarantees minimizing the number of TSVs. Experimental data consistently show that our approach works well in practice. Shih-Hsu Huang 黃世旭 2010 學位論文 ; thesis 43 zh-TW
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description 碩士 === 中原大學 === 電子工程研究所 === 98 === Three Dimensional (3D) IC technology stacks multiple integrated chips and its application is more and more popular. Therefore, developing EDA tools for the requirement of 3D architecture becomes urgent and important. In this thesis, we present an integer linear programming (ILP) model for the application of resource layer assignment in high level synthesis. Our objective is to minimize the number of signal through-silicon-vias (TSVs) under both the layer number constraint and the footprint area constraint. Our work includes two possible applications: (1) a post-processing method to perform TSV number minimization for high-level synthesis of 3D ICs; (2) a post-processing method to transfer a design from 2D IC structure into 3D IC structure. Note that our approach guarantees minimizing the number of TSVs. Experimental data consistently show that our approach works well in practice.
author2 Shih-Hsu Huang
author_facet Shih-Hsu Huang
Tsorng-Yu Huang
黃琮淯
author Tsorng-Yu Huang
黃琮淯
spellingShingle Tsorng-Yu Huang
黃琮淯
A Post-Processing Approach to Minimize TSV Number in High-Level Synthesis
author_sort Tsorng-Yu Huang
title A Post-Processing Approach to Minimize TSV Number in High-Level Synthesis
title_short A Post-Processing Approach to Minimize TSV Number in High-Level Synthesis
title_full A Post-Processing Approach to Minimize TSV Number in High-Level Synthesis
title_fullStr A Post-Processing Approach to Minimize TSV Number in High-Level Synthesis
title_full_unstemmed A Post-Processing Approach to Minimize TSV Number in High-Level Synthesis
title_sort post-processing approach to minimize tsv number in high-level synthesis
publishDate 2010
url http://ndltd.ncl.edu.tw/handle/44769486642214863678
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