| Summary: | 碩士 === 中原大學 === 物理研究所 === 98 === We studied the annealing effects of silver films deposited on various substrates. In this work, we put a metallic layer between a substrate and a silver film to change the characteristic of the substrate. In order to increase the adhesion between the silver film and the substrate, we deposited chromium as a middle layer. In the beginning, we deposited sliver and chromium (Ag layer ~ 250nm. Cr layer ~ 10nm) on sodalime glass and sapphire substrates. Then the samples were annealed under temperatures ranging from 150°C to 400°C in air. Finally, we observed the morphology of the samples by AFM, and examined their structures by XRD and FTIR.
The results show that the adhesion and the electrical resistivity increase with the deposited chromium. Comparing the morphology and the conductivity of the samples of sodalime glass and sapphire substrates, we believe that the lattice orientation of the sapphire substrates induces less aggregated clusters and larger electrical resistivity of the samples after annealing.
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