Optical Properties of Chromium Oxynitride Coatings Deposited by DC Magnetron Sputtering.

• Main Authors: Tzu-Wei Peng, 彭梓瑋
• Other Authors: Ta-Chin Wei
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/29228308686293123143

碩士 === 中原大學 === 化學工程研究所 === 98 === The black matrix layer on the color filter layer plays a role in light shielding. Its main function is to shield the light from the backlight light source except the openings (pixels). Thus, it can furtherly enhance the contrast ratio, prevent the color mixing from the RGB Subpixel adjacent to the shading layer, and keep the color purity level. In addition, it can avoid the influence of photoelectric effect toward the signal transmission of the thin film transistor. The black matrix can be catogrized into two by the materials: the chromium metal film type BM (Cr-BM) and the black shading layer of resin type BM (RBM). The thesis uses DC magnetron sputtering to study the the anti-reflection coating film in the CrBM deposition layer on glass substrates. The results shows that using single CrOx or CrNy film as anti-reflection coating, the reflectance would reduce with the increase of the film thickness. However, the reflectance reduction by the single-layer anti-reflection coating is still limited. Only the double-layer anti-reflection coating can meet the reflectance reduction requirements. Taking the index of refraction and extinction coefficient under various wavelengths into the software, Essential Macleod, for the optical reflectance simulation of CrOx, CrNy membrane, it is found that the empirical data, the reflectance, is consistent with the simulation result. Moreover, the introduction of nitrogen gas into the CrOx coating would lead the increase in the index of refarction and the extinction coefficient. Nevertheless, CO2 would cause a reduction in the index of refraction and the extinction coefficient on the CrNy film. When using CrOxNy film to replace CrOx and CrNy films, it is able to not only achieve the desired some anti-reflection level but also to narrow the gap in the etching rate of the Cr, CrNy, CrOx. At the end, the study found that when the film thickness of CrOx coating reaches 22 nm (Ar = 65 sccm, CO2 = 180 sccm, N2 = 30 sccm), CrNy coating reaches 23 nm (Ar = 65 sccm, CO2 = 100 sccm, N2 = 220 sccm ), and Cr coating reaches 92 nm (Ar = 65 sccm, CO2 = 10 sccm, N2 = 20 sccm), a low reflectance, 400 nm = 8.5%, 500 nm = 4.9%, 700 nm = 7.3% is obtained.