以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究
碩士 === 正修科技大學 === 機電工程研究所 === 98 === The zinc oxide thin films had been prepared by Spray Pyrolysis. The effects of substrate temperature and precursor concentration on structure,photoluminescence and resistivity were investigated by Rietveld Method.The ZnO film with Wurtzite phase was obtained. The...
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ndltd-TW-098CSU006570252015-10-28T04:07:10Z http://ndltd.ncl.edu.tw/handle/60950208937557446111 以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究 Chang, Han-Jie 張漢桔 碩士 正修科技大學 機電工程研究所 98 The zinc oxide thin films had been prepared by Spray Pyrolysis. The effects of substrate temperature and precursor concentration on structure,photoluminescence and resistivity were investigated by Rietveld Method.The ZnO film with Wurtzite phase was obtained. The structure and resistivity was declined with the decrease in N content which decays with time. However, the similar phenomena was not found in the PL measurement.Analyzed by XRD, the (002) preferred orientation of ZnO thin film was found and its intensity increased with both precursor concentration and substrate temperature. The residual N content increased with precursor concentration while decreased with substrate temperature. For resistivity measurement, the decay duration increased with precursor concentration and decreased with substrate temperature increasing. For PL measurement, the exited wave length was shifted from 548 nm, green light, to 461 nm, blue light, as the precursor concentration was increased from 1 to 9 M, and it was shifted from 548 nm to 497 nm when the substrate was increased from 250 to 350°C. 黃宏欣 2010 學位論文 ; thesis 75 zh-TW |
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碩士 === 正修科技大學 === 機電工程研究所 === 98 === The zinc oxide thin films had been prepared by Spray Pyrolysis. The effects of substrate temperature and precursor concentration on structure,photoluminescence and resistivity were investigated by Rietveld Method.The ZnO film with Wurtzite phase was obtained. The structure and
resistivity was declined with the decrease in N content which decays with time. However, the similar phenomena was not found in the PL measurement.Analyzed by XRD, the (002) preferred orientation of ZnO thin film was found and its intensity increased with both precursor concentration and substrate temperature. The residual N content increased with precursor concentration while decreased with substrate temperature. For resistivity measurement, the decay duration increased with precursor concentration and decreased with substrate temperature increasing. For PL measurement, the exited wave length was shifted from 548 nm, green light, to 461 nm, blue light, as the precursor concentration was increased from 1 to 9 M, and it was shifted from 548 nm to 497 nm when the substrate was increased from 250 to 350°C.
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黃宏欣 |
author_facet |
黃宏欣 Chang, Han-Jie 張漢桔 |
author |
Chang, Han-Jie 張漢桔 |
spellingShingle |
Chang, Han-Jie 張漢桔 以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究 |
author_sort |
Chang, Han-Jie |
title |
以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究 |
title_short |
以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究 |
title_full |
以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究 |
title_fullStr |
以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究 |
title_full_unstemmed |
以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究 |
title_sort |
以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究 |
publishDate |
2010 |
url |
http://ndltd.ncl.edu.tw/handle/60950208937557446111 |
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