以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究

碩士 === 正修科技大學 === 機電工程研究所 === 98 === The zinc oxide thin films had been prepared by Spray Pyrolysis. The effects of substrate temperature and precursor concentration on structure,photoluminescence and resistivity were investigated by Rietveld Method.The ZnO film with Wurtzite phase was obtained. The...

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Main Authors: Chang, Han-Jie, 張漢桔
Other Authors: 黃宏欣
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/60950208937557446111
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spelling ndltd-TW-098CSU006570252015-10-28T04:07:10Z http://ndltd.ncl.edu.tw/handle/60950208937557446111 以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究 Chang, Han-Jie 張漢桔 碩士 正修科技大學 機電工程研究所 98 The zinc oxide thin films had been prepared by Spray Pyrolysis. The effects of substrate temperature and precursor concentration on structure,photoluminescence and resistivity were investigated by Rietveld Method.The ZnO film with Wurtzite phase was obtained. The structure and resistivity was declined with the decrease in N content which decays with time. However, the similar phenomena was not found in the PL measurement.Analyzed by XRD, the (002) preferred orientation of ZnO thin film was found and its intensity increased with both precursor concentration and substrate temperature. The residual N content increased with precursor concentration while decreased with substrate temperature. For resistivity measurement, the decay duration increased with precursor concentration and decreased with substrate temperature increasing. For PL measurement, the exited wave length was shifted from 548 nm, green light, to 461 nm, blue light, as the precursor concentration was increased from 1 to 9 M, and it was shifted from 548 nm to 497 nm when the substrate was increased from 250 to 350°C. 黃宏欣 2010 學位論文 ; thesis 75 zh-TW
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description 碩士 === 正修科技大學 === 機電工程研究所 === 98 === The zinc oxide thin films had been prepared by Spray Pyrolysis. The effects of substrate temperature and precursor concentration on structure,photoluminescence and resistivity were investigated by Rietveld Method.The ZnO film with Wurtzite phase was obtained. The structure and resistivity was declined with the decrease in N content which decays with time. However, the similar phenomena was not found in the PL measurement.Analyzed by XRD, the (002) preferred orientation of ZnO thin film was found and its intensity increased with both precursor concentration and substrate temperature. The residual N content increased with precursor concentration while decreased with substrate temperature. For resistivity measurement, the decay duration increased with precursor concentration and decreased with substrate temperature increasing. For PL measurement, the exited wave length was shifted from 548 nm, green light, to 461 nm, blue light, as the precursor concentration was increased from 1 to 9 M, and it was shifted from 548 nm to 497 nm when the substrate was increased from 250 to 350°C.
author2 黃宏欣
author_facet 黃宏欣
Chang, Han-Jie
張漢桔
author Chang, Han-Jie
張漢桔
spellingShingle Chang, Han-Jie
張漢桔
以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究
author_sort Chang, Han-Jie
title 以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究
title_short 以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究
title_full 以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究
title_fullStr 以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究
title_full_unstemmed 以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究
title_sort 以精算法探討熱裂解法所製備氧化鋅薄膜殘留氮原子的結構及性質之相依性研究
publishDate 2010
url http://ndltd.ncl.edu.tw/handle/60950208937557446111
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