Design of Linear Microwave Antenna and its Plasma Electrical Characteristics
碩士 === 淡江大學 === 物理學系碩士班 === 97 === The major equipment of thin film silicon cells is Plasma Enhance Chemical Vapor Deposition (PECVD). Microwave linear PECVD is used for large area deposition, and have advantages of high plasma density and low ion energy. But it follows some questions of standing wa...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/n3kz9y |