| Summary: | 碩士 === 淡江大學 === 物理學系碩士班 === 97 === The major equipment of thin film silicon cells is Plasma Enhance Chemical Vapor Deposition (PECVD). Microwave linear PECVD is used for large area deposition, and have advantages of high plasma density and low ion energy. But it follows some questions of standing wave effect, impedance matching and polluted silicon. The study is trying to design a new linear microwave antenna to solve these difficulties.
The filed distribution of linear microwave antenna simulated by High Frequency Structure Simulator (HFSS). The change of chamber volume and position can to avoid standing wave effect. Utilizing Conformal Mapping can get impedance of different angular slot linear antenna, then we can complete impedance matching by Waveguide-to-Coaxial Design and Chebyshev table. The last is to design a coaxial quartz tube, and add a partition to avoid polluted silicon, and getting gas distribution by Fluent.
After finishing linear microwave antenna design and making ,it can produce linear plasma.
We are grateful to the National Center for High-performance
Computing for computer time and facilities.
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