| Summary: | 碩士 === 國立臺北科技大學 === 製造科技研究所 === 97 === This paper focuses on the Phase Shift Used Exposure Using Pin Array Mask. The approach is by using basic dynamic mask concept and the phase difference planning theory to upgrade the image resolution from projecting source light.
The DLP projector was chosen as the source light, and to cooperate with optical convex lens and zoom lens. For lessening the image pixel, setting a high resolution pin array mask during the process. After that, to find the optimum parameters about the position of the pin array mask, image quality and optical designing to show the high resolution image.
Finally, to compare the results of projected image, discuss the feasibility of phase difference planning and offer improved way on blurring image, dispersion and experimental designing.
|
|---|
