Development of Maskless Photolithography System Using Digital Micromirror Device and Ultra-Violet Light Source
碩士 === 國立臺灣科技大學 === 機械工程系 === 97 === The aim of this study is to improve the DMD (Digital Micromirror Device) Maskless Photolithography System, by using Ultra-Violet Light Source. In the system, the eyepiece of microscope was employed to observe the pattern from DLP（Digital Light Processing）project...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/73422996365560321907 |