Development of Maskless Photolithography System Using Digital Micromirror Device and Ultra-Violet Light Source

• Main Authors: Sin-da Pu, 蒲鑫達
• Other Authors: Jeng-Ywan Jeng
• Format: Others
• Language: zh-TW
• Published: 2009
• Online Access: http://ndltd.ncl.edu.tw/handle/73422996365560321907

碩士 === 國立臺灣科技大學 === 機械工程系 === 97 === The aim of this study is to improve the DMD (Digital Micromirror Device) Maskless Photolithography System, by using Ultra-Violet Light Source. In the system, the eyepiece of microscope was employed to observe the pattern from DLP（Digital Light Processing）project on the photoresist. Therefore, the focus of image and control of photolithography quality can be analysed. This sdudy uses Ultra-Violet Light source to replace the original visible light source in DLP. Since the wavelength of UV light is shorter, the system resolution can be improved. Because UV light or visible light source does not uniform, a step mask photolithography to control the uniformity of exposure. This experiment manufactures the smallest line width pattern and electrode pattern, and confirms this resolution of system by the experiment result. It will be proved that system resolution promotes from 3.4μm (visible light source) to 2.4μm (ultraviolet light photo source),using step mask photolithography to be possible to manufacture complex or the slightly big area electrode design.