| Summary: | 碩士 === 國立臺灣科技大學 === 電子工程系 === 97 === In this dissertation, the different array interval structure of nanocrystalline diamond (NCD) films were fabricated to study the effect on the field emission properties and gas ionization sensors on different pressure in nitrogen gas, respectively. NCD films were deposited on silicon substrate by microwave plasma chemical vapor deposition system. The surface morphology of NCD films were characterized by the field emission scanning electron microscopy. The characterization of NCD films were analyzed by Raman, XPS and AFM to show the quality, the surface composition and average roughness of nanocrystalline diamond, respectively. The array structures were fabricated by photolithography technique with the interval of 100 , 500 and 1000μm, respectively..
Field emission properties were measured with anode voltage from 0 to 1100 V. It is found that the turn on electric field were improved from 14.67 V/μm to 8.5 V/μm when the array structure interval was increased from 100μm to 1000μm. It is indicated that the field emission properties were improved with the array interval increased. The arrayed nano-crystalline diamond devices of gas ionization sensors were performed using N2 gas with the array interval of 100, 500 and 1000μm, respectively. However, it was found that the breakdown voltage decreased with the array interval decreased.
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