Combination of Chemical Vapor Deposition and Atomic Layer Deposition Method for Pt-Ru Catalyst Deposition on Si(111) Substrate
碩士 === 國立臺灣科技大學 === 化學工程系 === 97 === Pt-Ru alloy can be produced with some methods. One of these methods is applying thin film technology. The aim of this research is to find the reaction zone of depositing Pt-Ru alloy catalyst by atomic layer deposition (ALD) method. Before using ALD method, the re...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/03557303134725953357 |