| Summary: | 碩士 === 國立臺灣大學 === 生醫電子與資訊學研究所 === 97 === The purpose of this study is to design an infrared emitter, and to utilize its narrow bandwidth infrared radiation to irradiate Escherichia coli for 24 hours, in order to identify the specific waveband of infrared radiation which may affect the cell development of Escherichia coli. Infrared radiation emitters used in this study are fabricated based on the principle of surface plasmon. The heat is generated by sending electric current to the molybdenum film on silicon substrate. The infrared source can be achieved by heating the triple layer structure which consists of a SiO2 layer between two Ag films on a silicon substrate. The emission wavelength can be altered by changing the lattice constant and diameter of the hole arrays. In this study, plasmonic thermal emitters with different emission peak wavelengths, i.e., 3.1, 3.5, 4.0, 4.5, and 5.0 μm, were designed and fabricated. The smallest full width at half maximum (FWHM) could be shrunk down to 0.5μm. The highest emitting power can reach 165mW/cm2 at a temperature of 300oC. After 24 hours exposure to infrared radiation with different wavelength, the cell colony diameters of Escherichia coli are measured to understand the cell growth. Two dimensional protein gel electrophoresis and mass spectrometry are also applied to observe the protein expressions pattern. From the results, the cell growth under infrared radiation with peak wavelength at 4, 4.5, 5μm is enhanced. The infrared radiation will also affect the protein expressions. When the cell growth is enhanced by the infrared radiation, its protein expressions are up-regulated. On the contrary, if the cell growth is no significant changed, its protein expressions are down-regulated.
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