In-situ Monitoring the Plasma Etching Processes of SiO2 and Si and the Analysis of Surface Roughness
碩士 === 國立清華大學 === 工程與系統科學系 === 97 === Abstract Plasma etching is an important etching process in the production of integrated circuits. In the plasma etching process, the ellipsometry can be used to monitor the etching process during the etching process. An in-situ ellipsometer using photo elastic...
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| Format: | Others |
| Language: | zh-TW |
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2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/20195855199882943688 |