A study of electromagnetic force-assisted Micro- and nano-imprinting technology

博士 === 國立清華大學 === 動力機械工程學系 === 97 === In recent years, microstructure devices and micro-systems have been widely used in various applications such as information processing, optical communication, optoelectronics, flat panel display and bio-technology. With the paramount concern of cost in many new...

Full description

Bibliographic Details
Main Authors: Wen, Ting TIng, 溫婷婷
Other Authors: Hocheng, Hong
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/60438494779605127919
Description
Summary:博士 === 國立清華大學 === 動力機械工程學系 === 97 === In recent years, microstructure devices and micro-systems have been widely used in various applications such as information processing, optical communication, optoelectronics, flat panel display and bio-technology. With the paramount concern of cost in many new micro-system applications, process technology is becoming one of the most important elements for mass production. However, the traditional processes involve high temperature, high pressure and require expensive facilities. They are complicated and time-consuming batch-wise processes. From this perspective, there are two innovative imprinting technologies for rapid fabricating micro or nano-devices and magnetic structure proposed in the current study. One is Magnetic force-assisted imprint technique. In this study, an electromagnetic force assisted imprinting facility with UV exposure capacity has been designed, constructed and tested. In use of electromagnetic force to press the magnetic stamp written with submicron-scale features into a UV-curable resist on the substrate, the liquid photopolymer can be patterned at room temperature. Under the proper processing conditions(magnetic force, pressing duration and UV curing dose), the polymeric microlens arrays and nano-wire structures can be successfully fabricated and have smooth surface and uniform property over a large area. The other is ferromagnetic nanopowder-assisted imprint technology for reduced and uniform pressure during magnetic force-assisted imprint. Fe-powder is blended into the resist which is attracted on the mold written with submicron-scale features by the electromagnetic force. The experimental results show the uniform and clearly transferred patterns into the resist with less electromagnetic force. This technique implies the potential for efficient fabrication of submicron-scale features at less-force and one-step direct forming magnetic on large area with high productivity at low cost. In summary, this innovative low-cost and high-efficiency technique has many advantages over the conventional techniques. It shows the potential for fabricating micro and submicron polymer and magnetic structures at room temperature and low pressure on large substrates with high productivity at 10~20 seconds per cycle. The author believes that the novel process is expected to give an impact to the micro-system fabrication technology and to create a highly value-added technology in optoelectronics industry.