Investigation of Manufacture and Process of Microlens Arrays

碩士 === 國立東華大學 === 材料科學與工程學系 === 97 === The purpose of this study is to fabricate high-fill-factor spherical/ aspherical microlens arrays by using photolithography, molding, and UV-forming technologies. The lifetime of the PDMS mold is also studied. The first topics in this study are to investigate t...

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Bibliographic Details
Main Authors: Jie-Ming Kang, 康傑銘
Other Authors: Mao-Kuo Wei
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/81645306450340182764
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Summary:碩士 === 國立東華大學 === 材料科學與工程學系 === 97 === The purpose of this study is to fabricate high-fill-factor spherical/ aspherical microlens arrays by using photolithography, molding, and UV-forming technologies. The lifetime of the PDMS mold is also studied. The first topics in this study are to investigate the influence of imprinting number of the PDMS mold on the surface morphology of duplicated microlens arrays, the influences of concentration and heat treatment of the anti-sticking agent, and the usage of water-pressure enhanced imprint apparatus on the mold lifetime, the surface morphology of microlenses, and the thickness of residue layers. The second issues are to study the influences of the process parameters of proximity printing on the surface morphology of microlens arrays, in order to directly fabricate spherical microlenses. Theses parameters include mask type, gap distance, softbake duration, proximity gap, and exposure dose. The final items are to investigate the process parameters, including exposure dose and gap distance, of diffuser lithography on the surface morphology of microlenses. The results showed that microstructured films were duplicated near perfectly more than 15 times by using water pressure assisted imprint apparatus. Microlens arrays were successfully fabricated through controlling exposure gap in the proximity printing. High-fill-factor microlenses were also manufactured by adjusting the exposure dose and gap distance in the diffuser lithography.