Study of self-assembly of Copper Oxidemicro/nanostructures by photo-reduction method

• Main Authors: Tsung-Han Shen, 沈宗漢
• Other Authors: Wen-Ku Chang
• Format: Others
• Language: zh-TW
• Published: 2009
• Online Access: http://ndltd.ncl.edu.tw/handle/02888972595990106049

碩士 === 國立東華大學 === 材料科學與工程學系 === 97 === In this study, we synthesis micro/nanostructure copper oxide on TiO2 film adhere a small metal island by photo-reduction self-assembly method using Copper (II) Sulfate and Copper Chloride. The sample preparation process is deposits TiO2 on ITO glass and adhere metal upper, the preparation completes sample soak in reduction solution and accepts the illumination, and produce electrons through the simple oxidation reaction of Metal Island and photo catalytic effect, electron occur reduction reaction with metal cation in reduction solution, produce product in sample surface The analysis result of XRD and TEM confirms that the reduction is copper oxide. The light irradiates time and the concentration of reduction solution is the primary factor of effect particle growth. When light irradiate 1 Hour and the concentration of reduction solution is 10ppm, we can get the regular and size about 1μm particles, two mode to produce reaction electrons on sample and the edge of sample has the Point discharge effect make edge of sample has higher density of reduction electrons. Different reduction electrons density may affect the reduction structure of copper oxide including Octahedron structure,skeleton crystals and other regular structures. In the self-assembly processes, the copper oxide of interior fills with defects, finally the last growth face of the structure is the close packed face (111)