Energy contamination control in ultra-low energy ion implantation

碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 97 === With the flourishing development of semiconductor technology。The layout of the integrated circuit is more and more complicated,and the transistor size is more and more tiny also. It is the certain result that the current channel becomes shorter below...

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Bibliographic Details
Main Authors: Chuang, Yuan-Kai, 莊淵凱
Other Authors: 張翼
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/74220980848017354632

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