Run-to-Run Etching Depth Control for TCP Poly-Silicon etcher
碩士 === 國立交通大學 === 機械工程系所 === 97 === The development of Integrated Circuits (IC) is moving toward higher and higher density. In echoing this trend, the size of all kinds of elements and associated line widths have to be narrowed accordingly. Therefore, how to transfer the pattern onto wafers accurat...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/79940287835934689561 |