Effect of compressive stress on the nickel sheet induced lateral crystallization of amorphous silicon thin film.
碩士 === 國立交通大學 === 材料科學與工程系所 === 97 === The purpose of this study is to develop a low-cost fabrication method of metal induced lateral crystallization of amorphous silicon film, which can replace the expensive coating equipment. After executed compressive stress at the stresses ranging from 265.8MPa...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/17619348453614015459 |