Fabrication of Grating Structures with Periods Less Than 0.5 μm on SOI(110) Wafers Using Scanning Probe Lithography
碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 97 === The purpose of the study is to fabricate grating period less than 0.5 μm using Scanning Probe lithography. The thesis is organized with three parts. First, the efficiencies of lithography oxidation were measured and discussed using various DC voltages, AC fr...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/25728258512109143702 |