Design and fabrication of inter-digitated contact on III-nitride solar cells
碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 97 === In this thesis, all samples used were grown by metal organic chemical vapor deposition system (MOCVD). In order to get the optimal fabricationparameter, we try many different parameters. First, We decreased the roughness from 58.2nm to 5.54nm successfully by...
Main Authors: | Yu-Han Yeh, 葉玉涵 |
---|---|
Other Authors: | Su Yan-Kuin |
Format: | Others |
Language: | en_US |
Published: |
2009
|
Online Access: | http://ndltd.ncl.edu.tw/handle/30644400597724011829 |
Similar Items
-
Fabrication and Characterization of III-Nitride Solar Cells
by: Tsung-Wei Deng, et al.
Published: (2013) -
Design and Fabrication of Sub-wavelength Structures on Silicon Nitride for Solar Cells
by: Sahoo, Kartika Chandra, et al.
Published: (2009) -
Design and Fabrication of III-Nitride Multiple Quantum Well Photovoltaic Devices
by: Kuan-YuLin, et al.
Published: (2012) -
Design, fabrication and characterization of III-nitride PN junction devices
by: Limb, Jae Boum
Published: (2007) -
Photovoltaic potential of III-nitride based tandem solar cells
by: Yassine Sayad
Published: (2016-09-01)