p/i(nc-Si:Hx/a-Si:Hy multilayers)/n solar cells prepared by periodical switching RF plasma
碩士 === 國立中興大學 === 電機工程學系所 === 97 === In this thesis, 13.56 MHz plasma-enhanced chemical vapor deposition (Pulsed-PECVD) with pulse modulation of RF plasma is used to fabricate hydrogenated nano-crystal silicon (nc-Si:H) and hydrogenated amorphous silicon (a-Si:H) films by changing RF power, hydrogen...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/14734844647280227155 |