Ti-Al-Si-N沉積在不銹鋼基材之高溫氧化性能研究

• Main Authors: Bo-Yan Chen, 陳柏諺
• Other Authors: Yin-Yu Chang
• Format: Others
• Language: zh-TW
• Published: 2009
• Online Access: http://ndltd.ncl.edu.tw/handle/29603312513888816544

碩士 === 明道大學 === 材料暨系統工程研究所 === 97 === Nanocamposite Ti-Al-Si-N thin films were deposited on stainless steel substrates by using a cathoic arc evaporation (CAE) system, The structural, mechanical properties and high temperature oxidation behaviors of these films were studied. For the high temperature oxidation test, the films were annealed 800℃ in air for 20、40、60、80 and 100 minutes. In this study, a field emission scanning electron microscope and a glancing angle X-ray diffractometer were used to characterize the microstructure and phase identification of the as-deposited and annealed films. The composition, chemical bonding and depth profile were evaluated by X-ray photoelectron spectroscopy and energy dispersive spectrometry. For the CAE deposition of Ti-Al-Si-N thin films, Ti50Al50、titanium and Ti80Si20 alloy targets were used and located at different positions to abtain (Ti0.66Al0.32Si0.02)N, (Ti0.8Al0.17Si0.03)N and (Ti0.85Al0.03Si0.12)N with different chemical comtents. (Ti0.85 Al0.03Si0.12)N possessed hardness (38.7 GPa) higher than TiAlN (29.4 GPa) thin films , due to a-Si3N4 existed at grain boundaries. The high temperature oxidation test, showed that (Ti0.66Al0.32Si0.02)N with rich Al content, demonstrate excellent anti-oxidation ability. (Ti0.85 Al0.03Si0.12) N thin films with higher Si content showed short nano-rod like TiO2 after oxidation. The growth of TiO2 nano rods was suppressed by SiO2 at grain boundaries. With low Al and Si contents, the (Ti0.8Al0.17Si0.03)N thin films showed obvious TiO2 nano rods after oxidation. The diameter of TiO2 nano rods increased (20nm→62nm) with increasing annealing time (20mins→100mins). It has been found that the high temperature oxidation behavior was influenced by the structure and alloy content of the Ti-Al-Si-N thin films.