| Summary: | 碩士 === 明道大學 === 材料暨系統工程研究所 === 97 === Abstract
The main purpose of this study is to investigate the photocatalytic properties and photo-catalysis efficiency studies of nano titanium dioxide prepared by using microwave synthesis were studied. Metal plasma ion implantation has being successfully developed for improvement the optical properties of semiconductor materials. The nano-crystalline TiO2 particles was prepared by microwave process and deposited on glass substrates using of spin coating technique. The pure anstase TiO2 phase was obtained after a 540°C calcinations process in atmosphere. Subsequently, the TiO2 film was doped with transition metals such as Co and Ag by metal plasma ion implantation (MPII). The accelerating voltage of metal ions was set at 30 keV with implantation dosages of 1 x 1015-1 x 1016 (dose/cm2).
In this study, field emission scanning electron microscope, transmission electron microscope, atomic force microscopy and X-ray diffraction using Bragg-Brentano and glancing angle parallel beam geometries were used to characterize the microstructure of the ion-implanted. The composition and chemical bonding of ion-implanted TiO2 films were evaluated by X-ray photoelectron spectrometry (XPS). The optical absorption spectra of the ion-implanted films were measured using a UV-visible spectrophotometer. Optical characterization showed the shift in optical absorption wavelength at infrared ray side, which was correlated with the structure variation of the metal-ion implanted into the nanocrystalline TiO2.
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