| Summary: | 碩士 === 國立高雄應用科技大學 === 機械與精密工程研究所 === 97 === Currently, the photonic crystals are extensively applied in the optics and the optoelectronics. In order to pursuit high performance and efficiency, the combination of electricity and light will be inevitable. Photonic crystal device design and production technology has become increasingly sophisticated. However, in order to promote the combination of light-emitting photonic crystal components to enhance the overall efficiency of light-emitting device. One has to think about streamline production processes and to improve production efficiency when achieve the goal of lowering production costs. In the current study, nano imprint lithography was used to create a photonic crystals structure film in organic light-emitting diode component.
By utilizing two different kinds of stamp treatment, such as stamp of photonic crystals structures and grating structures in PDMS, four different kinds of resist material, such as molecular weight of PMMA in 15K, 350K, 996K and 996K+15K in double layers, were studied. The better results with good nano structure formability belong to a stamp of photonic crystal mold and molecular weight of PMMA in 350K and 996K +15K in double layers. As to PMMA of 15K, due to its extremely good flow ability, the pattern transfer is not good.
Finally, photonic crystals with nano structure in period of 400.86nm was fabricated as a photonic crystal films and was integrated into an organic LED. From experiments, the organic LED without photonic crystal films behaves Voc=15.44V, Isc=0.00903A, Luminous= 211cd/m2, ηL= 2.336cd/A and ηP=0.475 lm/W; the organic LED with the above photonic crystal films behaves Voc=10V, Isc=0.009012A, Luminous= 250cd/m2, ηL= 2.774cd/A and ηP= 0.871 lm/W, which shows that the latter perform well.
Keyword：Nanoimprint, Photonic Crystal Films, Organic Light-Emitting Diodes
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