Study on Nitride Films of TiVCrAlZr by Radio Frequency Magnetron Sputtering

碩士 === 中原大學 === 機械工程研究所 === 97 === In this thesis, the target of high-entropy alloy, TiVCrAlZr, was smelted by electric arc smelting furnace of vacuum. Then the Nitride thin films of TiVCrAlZr were deposited on silicon wafer by Radio Frequency (RF) Magnetron Sputtering. This experiments were discuss...

Full description

Bibliographic Details
Main Authors: Yi-Kun Chen, 陳宜堃
Other Authors: Shia-Chun Chen
Format: Others
Language:zh-TW
Published: 2009
Online Access:http://ndltd.ncl.edu.tw/handle/15030392869423125686