| Summary: | 碩士 === 中原大學 === 電子工程研究所 === 97 === Abstract
The main purpose of this research is to construct an methodology to evaluate the possibility of recycling of photoresist used in the photolithographic processing of TFT-LCD production line. From the results obtained in this study, it is expected to promote the cooperation between the TFT-LCD panel manufacturer and photoresist recycling company and finally an efficient method to recycle the waste photoresist can be produced. This will greatly shorten the evaluation procedure and reduce the production cost of panels for TFT-LCD
panel manufacturers.
Photoresist is the most important chemical material used in photolithography process. It is used to transfer the circuit pattern designed on the photomask to the glass substrate surface during a thin film transistor processing.
In this study we examine the recycling possibility of the positive photoresist for the same process. If this possibility is recognized, the manufacture cost of generation 3.5~5 photo line of array process in LCD production and the waste of photoresist can be reduced. It can also make the use of photoresist more
effectively without losing the product quality.
A series of experiments were conducted to evaluate the recycled photoresist for being reused in the same photolithographic processing; including the spin coater cup wash, spin curve, developing time, dark erosion, exposing energy, adhesion, and use the instrument to compare the original and the waste photoresists, physical properties, metal content, mura & defect, critical
dimension.
It is concluded that the recycling of photoresist on the non-metal layer is possible during the mass-production of TFT-LCD panels under the condition that the viscosity of recycled photoresist is well controlled. In addition, the storage time of recycled photoresist after being gathered must be well noticed to prevent the deterioration of its quality.
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