The Study of CMOSFET Performance Fabricated on Hybrid Orientation Substrates
碩士 === 正修科技大學 === 電子工程研究所 === 97 === We utilize hybrid orientation technique (HOT), i.e., wafer bonding and selective epitaxy, to fabricate CMOSFET. The HOT CMOSFET consists of nMOSFET grown on (100) plane and pMOSFET grown on (110) plane. Thus, (110) pMOSFET has a great improvement in drive current...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2009
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| Online Access: | http://ndltd.ncl.edu.tw/handle/30623618314988152866 |