An Analytic Model on the Distribution of Residual Stresses in a Thin Film/Substrate System

碩士 === 元智大學 === 機械工程學系 === 96 === During an epitaxial process, misfit strains due to the mismatch of coefficient of thermal expansion (CTE) are developed in the film and the substrate, leading to lattice mismatch and dislocation movement as well as residual stresses. A simple analytic model is devel...

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Bibliographic Details
Main Authors: Yi-Ta Lee, 李奕達
Other Authors: N. Yu
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/32144055337857867275