Study of InGaN/GaN multilayer using x-ray.
碩士 === 淡江大學 === 物理學系碩士班 === 96 === X-ray diffraction (XRD) and X-ray reflectivity (XRR) are used to characterize the structure of the InGaN/GaN multiple quantum wells (MQWs) grown on the Al2O3 (0 0 1) substrate .Using these measurements, not only the layered structure of the MQWs is revealed c...
Main Authors: | Chih-Hsien Ou, 歐致先 |
---|---|
Other Authors: | 杜昭宏 |
Format: | Others |
Language: | zh-TW |
Published: |
2008
|
Online Access: | http://ndltd.ncl.edu.tw/handle/79326480291203997876 |
Similar Items
-
Investigation of InGaN/GaN Nanostructures Using the X-ray Diffraction Techniques
by: Wen-Yu Shiao, et al.
Published: (2009) -
Analysis of the InGaN ∕ GaN LED With an InGaN ∕ GaN pre-buffer layer
by: Po-Yi Hou, et al.
Published: (2008) -
Study on the Optical Properties for InGaN/GaN Multilayer Quantum Well Structures
by: Kai-Hong Wang, et al.
Published: (2003) -
Investigations of the luminescence of GaN and InGaN/GaN quantum wells
by: PecharromaÌn-Gallego, RauÌl
Published: (2004) -
Advantages of InGaN–GaN–InGaN Delta Barriers for InGaN-Based Laser Diodes
by: Liwen Cheng, et al.
Published: (2021-08-01)